FloTron™ X is an extended range (200 - 1040 nm) fast spectrometer-based multiple channel process control system for technological plasma-based processes, such as reactive magnetron sputtering. FloTron™ X systems were designed to provide enhanced sensitivity and they therefore surpass others at providing reliable signals for even small cathodes (e.g. 3" circular). FloTron™ X systems do not lack speed, can be configured for single or multiple (2 to 5) zone large area processing, and are therefore excellent for both R&D and manufacturing.


FloTron, 2014 by Nova Fabrica Ltd